Publication

Byline

Location

US Patent Issued to Ricoh on July 21 for "Curable water-based composition, active-energy-ray-curable water-based composition, active-energy-ray-curable water-based ink, stored container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured product, and decorated body" (Japanese Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,780, issued on July 21, was assigned to Ricoh Co. Ltd. (Tokyo). "Curable water-based composition, active-energy-ray-curable water-based com... और पढ़ें


US Patent Issued to SAMSUNG ELECTRONICS on July 21 for "Brush polymer, photoresist composition including the same, and method of manufacturing integrated circuit device" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,781, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Brush polymer, photoresist composition inclu... और पढ़ें


US Patent Issued to NISSAN CHEMICAL on July 21 for "Resist underlayer film-forming composition comprising fluoroalkyl group-containing organic acid or salt thereof" (Japanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,782, issued on July 21, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Resist underlayer film-forming composition comprising fluoroalkyl g... और पढ़ें


US Patent Issued to ZHEJIANG CHEER TECHNOLOGY on July 21 for "Immersion liquid supply system and immersion liquid flow field removal method therefor" (Chinese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,783, issued on July 21, was assigned to ZHEJIANG CHEER TECHNOLOGY Co. LTD. (Hangzhou, China). "Immersion liquid supply system and immersion... और पढ़ें


US Patent Issued to SEMES on July 21 for "Irradiating module, and apparatus for treating substrate with the same" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,784, issued on July 21, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea). "Irradiating module, and apparatus for treating substrate... और पढ़ें


US Patent Issued to Taiwan Semiconductor Manufacturing on July 21 for "Lithography system and methods" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,785, issued on July 21, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Lithography system and methods" was... और पढ़ें


US Patent Issued to Robert Bosch, Carl Zeiss SMT on July 21 for "Method for operating an optical component, and optical component" (German Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,786, issued on July 21, was assigned to Robert Bosch GmbH (Stuttgart, Germany) and Carl Zeiss SMT GmbH (Oberkochen, Germany). "Method for o... और पढ़ें


US Patent Issued to SAMSUNG ELECTRONICS on July 21 for "Optical proximity correction method, mask manufacturing method, semiconductor chip manufacturing method using the same and computing device" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,787, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Optical proximity correction method, mask ma... और पढ़ें


US Patent Issued to Applied Materials on July 21 for "System, software application, and method for dose uniformity improvement" (California Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,788, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "System, software application, and method for dose un... और पढ़ें


US Patent Issued to Samsung Display, Samsung Electronics on July 21 for "Correction method of multi-beam exposure device" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,789, issued on July 21, was assigned to Samsung Display Co. LTD. (Gyeonggi-do, South Korea) and Samsung Electronics Co. Ltd (Gyeonggi-do, So... और पढ़ें